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Changzhou Junhe Technology Stock Co.,Ltd

Changzhou Junhe Technology Stock Co.,Ltd is a high-tech enterprise devoted to developing industrial fine chemicals,special equipment and services solution provider which was founded in Changzhou

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IT Industry Silicon Wafer Cleaning With Good Degreasing Performance

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    Buy cheap IT Industry Silicon Wafer Cleaning With Good Degreasing Performance from wholesalers
     
    Buy cheap IT Industry Silicon Wafer Cleaning With Good Degreasing Performance from wholesalers
    • Buy cheap IT Industry Silicon Wafer Cleaning With Good Degreasing Performance from wholesalers
    • Buy cheap IT Industry Silicon Wafer Cleaning With Good Degreasing Performance from wholesalers
    • Buy cheap IT Industry Silicon Wafer Cleaning With Good Degreasing Performance from wholesalers
    • Buy cheap IT Industry Silicon Wafer Cleaning With Good Degreasing Performance from wholesalers
    • Buy cheap IT Industry Silicon Wafer Cleaning With Good Degreasing Performance from wholesalers

    IT Industry Silicon Wafer Cleaning With Good Degreasing Performance

    Ask Lasest Price
    Brand Name : JUNHE
    Model Number : 1020
    Certification : ISO9001 TS16949 SGS
    Price : Negotiable
    Supply Ability : 2 Tons per Day
    Delivery Time : Ten days after receipt of advance payment
    • Product Details
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    IT Industry Silicon Wafer Cleaning With Good Degreasing Performance

    IT Industry Silicon Wafer Cleaning With Good Degreasing Performance


    The RCA clean process is based on a cleaning method developed at RCA Corporation to remove organic residue from silicon wafers. The cleaning solution is made up of 5 parts water, 1 part 27% ammonium hydroxide and 1 part 30% hydrogen peroxide. It removes organic contaminants and leaves a thin layer of oxidized silicon on the surface of the wafer.


    Silicon Wafer Cleaning feature


    1) single group products with perfect PPR(performance price ratio)

    2) be free from calcium, magnesium, metal, copper, lead and phosphor, and meet the requirement of ROHS.

    3)good degreasing performance to meet the requirement of high-accuracy IT area.


    Silicon Wafer Cleaning technical parameter


    classification

    project

    JH-1020 Silicon Wafer CleaningTest Standard
    AppearanceColorless to yellowish liquidvisualization
    Specific weight1.01-1.25densimeter
    pH12.0-14.0PH instrument
    free alkalinity(piont)≧13.5mgCYFC

    Silicon Wafer Cleaning instructions


    1) put pure water into cleaning tank till three-quarter, then, add agent in 3% -5% concentration, add water till working level, last, heat the bath solution till working temperature.

    2) need to change bath solution completely after degreasing certain amount silicon slice.

    3) reduce exposed time in air to avoid oxidation.

    4) working temperature 50-65 degree, disposal time: 2-5minutes.



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